Powall

Over Powall

Powall offers research & development services and licensing of IP on scalable production of nanostructured materials based on atomic layer deposition (ALD).

ALD is a chemical deposition method to obtain conformal coatings of controllable thickness on many types of substrate. Together with the Powall intellectual property and know-how on scalable production of nanostructured materials, this allows for efficient precursor use for catalysts, encapsulation of battery particles for improved durability, controlled release of medication, and many more applications.

Don't hesitate to contact us on info@powall.com for more information.

Trefwoorden

• (Nano) Particles
• Anode
• Atomic Layer Deposition
• Batteries
• Catalysts
• Cathode
• Coatings
• Electrolyzer
• Encapsulation
• Manufacturing
• Molecular Layer Deposition

Adres

• Hoofdkantoor

  Molengraaffsingel 82629JD DelftZuid-Holland, Nederland

Team per functiegebied

Gebaseerd op 17 openbare functieprofielen, stand van 3 september 2026.

• Research / R&D10
• Executive / C-Suite4
• Engineering / Software Development2
• Healthcare / Medical1